发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device whose conductive resistance is low and whose breakdown strength is high. SOLUTION: A low-resistance area 13 that is of the same conductive type as a growth layer 12 and whose concentration is higher than that of the growth layer 13 is arranged under the bottom of a base area 33. A current generating when the semiconductor device 1 is made conductive runs in the low-resistance area 13, so that the conductive resistance is lowered. A second conductive type embedded area 24 is arranged deeper in the low-resistance area 13 just beneath a gate electrode plug 54, thereby improving the breakdown voltage. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004327815(A) |
申请公布日期 |
2004.11.18 |
申请号 |
JP20030122064 |
申请日期 |
2003.04.25 |
申请人 |
SHINDENGEN ELECTRIC MFG CO LTD |
发明人 |
KUROSAKI TORU;SHISHIDO HIROAKI;KITADA MIZUE;KURI SHINJI;OSHIMA KOSUKE |
分类号 |
H01L29/78;H01L21/336;H01L29/06;H01L29/739;(IPC1-7):H01L29/78 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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