发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device whose conductive resistance is low and whose breakdown strength is high. SOLUTION: A low-resistance area 13 that is of the same conductive type as a growth layer 12 and whose concentration is higher than that of the growth layer 13 is arranged under the bottom of a base area 33. A current generating when the semiconductor device 1 is made conductive runs in the low-resistance area 13, so that the conductive resistance is lowered. A second conductive type embedded area 24 is arranged deeper in the low-resistance area 13 just beneath a gate electrode plug 54, thereby improving the breakdown voltage. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004327815(A) 申请公布日期 2004.11.18
申请号 JP20030122064 申请日期 2003.04.25
申请人 SHINDENGEN ELECTRIC MFG CO LTD 发明人 KUROSAKI TORU;SHISHIDO HIROAKI;KITADA MIZUE;KURI SHINJI;OSHIMA KOSUKE
分类号 H01L29/78;H01L21/336;H01L29/06;H01L29/739;(IPC1-7):H01L29/78 主分类号 H01L29/78
代理机构 代理人
主权项
地址