| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method capable of cleaning a droplet discharging head without affecting its droplet discharging action and forming a pattern with it when the droplet discharging head kept in storage where storing liquid is used is made to start operating again. SOLUTION: The pattern forming method forms a film pattern 33 by disposing the droplets 30 of a function liquid on a substrate P. The method comprises a first replacement process SA1 of purging the droplet discharging head 1 capable of disposing the droplet 30 and a pathway 4 containing a tube 40 which feeds the functional liquid to the droplet discharging head 1 by pure water, a second replacement process SA2 of replacing both the pure water and a solvent contained in the functional liquid with a solvent dissolving them both, a third replacement process SA4 of replacing the above solvent with the solvent contained in the functional liquid, a bank forming process of forming banks B corresponding to a film pattern on the substrate P, and a material disposing process of disposing droplets 30 in a groove 34 located between the banks B with the droplet discharging head 1. COPYRIGHT: (C)2005,JPO&NCIPI
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