MANUFACTURING METHOD OF MASK FOR FOCUS MONITOR, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a mask for a focus monitor which can form a highly precise monitor mark in a short time by using charged beams.

SOLUTION: This manufacturing method comprises a process of forming a first opening and a second opening 21 having a pattern shape corresponding to the first opening and surrounded by a laminated film consisting of a halftone film 2 on a translucent substrate and a light shielding film 3 on the halftone film in the surface region of the translucent substrate 1, and a process of etching the translucent substrate inside the second opening by irradiating an edge part of the second opening, the inside part of the second opening, and the outside part of the second opening with charged beams 52.

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