PHOTOSENSITIVE COMPOSITION FOR NEAR-INFRARED LASER EXPOSURE, NEGATIVE IMAGE FORMING MATERIAL USING THE SAME AND IMAGE FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive composition for near-infrared laser exposure which has high sensitivity to laser light in the infrared region and loses its photosensitivity upon long-time exposure to a white light, and to provide an image forming material using the photosensitive composition and an image forming method.

SOLUTION: The photosensitive composition for near-infrared laser exposure satisfies S2/S1≥2 between a minimum light exposure S1required to perform image formation by exposure with a near-infrared laser and a minimum light exposure S2required to perform image formation by exposure with a near-infrared laser after irradiation with light of 400 lx for 120 min. The photosensitive composition for near-infrared laser exposure contains (A) an epoxy acrylate resin, (B) an infrared absorbing dye having its absorption maximum at a wavelength of 650-1,300 nm and (C) a halomethyl-group-containing compound. The negative image forming material is obtained by forming a photosensitive layer comprising the photosensitive composition for near-infrared laser exposure on a support. In the image forming method, the image forming material is subjected to scanning exposure with a near-infrared laser light source and developed with an alkali developing solution.

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