发明名称 |
MICRO PARTICLES INJECTING PROCESS USING DIRECT MASK ON WORKPIECE TO FORM PATTERN WITH ULTRA-FINE CD |
摘要 |
<p>PURPOSE: Micro particles injecting process using a direct mask on a workpiece is provided to form a pattern with an ultra-fine CD(critical dimension) and enable minimal machining by forming a pattern directly on the workpiece to fabricate a mask. CONSTITUTION: A brittle material such as silicon or glass is formed by using micro particles injecting process and a photolithography technique. Photocurable resin and ultraviolet rays are used in fabricating a mask for the micro particles injecting process. A mask pattern(16) for only the micro particles injecting process is formed by using photoresist(SU-8 and the like) wherein a metal mask is generated.</p> |
申请公布号 |
KR20040097105(A) |
申请公布日期 |
2004.11.17 |
申请号 |
KR20040086590 |
申请日期 |
2004.10.28 |
申请人 |
KO, TAE JO |
发明人 |
KO, TAE JO;LEE, IN HWAN;PARK, DONG JIN |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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