发明名称 MICRO PARTICLES INJECTING PROCESS USING DIRECT MASK ON WORKPIECE TO FORM PATTERN WITH ULTRA-FINE CD
摘要 <p>PURPOSE: Micro particles injecting process using a direct mask on a workpiece is provided to form a pattern with an ultra-fine CD(critical dimension) and enable minimal machining by forming a pattern directly on the workpiece to fabricate a mask. CONSTITUTION: A brittle material such as silicon or glass is formed by using micro particles injecting process and a photolithography technique. Photocurable resin and ultraviolet rays are used in fabricating a mask for the micro particles injecting process. A mask pattern(16) for only the micro particles injecting process is formed by using photoresist(SU-8 and the like) wherein a metal mask is generated.</p>
申请公布号 KR20040097105(A) 申请公布日期 2004.11.17
申请号 KR20040086590 申请日期 2004.10.28
申请人 KO, TAE JO 发明人 KO, TAE JO;LEE, IN HWAN;PARK, DONG JIN
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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