PLANAR HEATER DEVICE FOR THERMAL PROCESS OF SUBSTRATE

摘要

An embodiment of the present invention relates to a planar heater device for a thermal process of a substrate. A technical subject to be solved is to provide the planar heater device for a thermal process of a substrate which can uniformly heat a large glass substrate used in a flat display panel. The planar heater device for a thermal process of a substrate comprises an upper plate, a lower plate, and a plurality of heater modules horizontally interposed between the upper and lower plates.