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发明名称
光阻用粗树脂之精制方法
摘要
本发明为提供一种可有效地去除光阻用粗树脂中所含之聚合物或低聚物等副产物之光阻用粗树脂之精制方法。此方法为使用至少溶解有(A)光阻用树脂及(B)酸产生剂之(C1)第1有机溶剂而得之光阻组成物以精制前述(A)成分之粗树脂的精制方法,其特征为,包含将光阻组成物中之(A)成分之浓度作为X,又,将(A)成分之粗树脂溶解于(C2)有机溶剂所得溶液中之粗树脂浓度作为Y时,(甲)调制使Y小于X之粗树脂溶液,其次(乙)将粗树脂溶液过滤之方法。
申请公布号
TW200424769
申请公布日期
2004.11.16
申请号
TW093102020
申请日期
2004.01.29
申请人
东京应化工业股份有限公司
发明人
羽田英夫;岩井武;宫入美和;室井雅昭;厚地浩太;富田浩明
分类号
G03F7/039
主分类号
G03F7/039
代理机构
代理人
林志刚
主权项
地址
日本
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