发明名称 Process and configuration for manufacturing resistors with precisely controlled low resistance
摘要 The present invention discloses a resistor supported on a metal plate composed of a low temperature coefficient of resistance (TCR) metallic material. The resistor includes at least two electrode columns composed of the low TCR metallic material disposed on the metal plate. The resistor further includes at least an electrode layer disposed on each of the electrode columns to form an electrode for each of the electrode columns. In a preferred embodiment, the low TCR metallic material composed of the metal plate further comprises a nickel-copper alloy. In another preferred embodiment, the electrode layer disposed on each of the electrode columns further comprises a copper layer and a tin-lead alloy layer on each of the electrode columns. In another preferred embodiment, the electrode columns disposed on the metal plate having a precisely defined position for providing precisely defined resistance for the resistor ranging between one milli-ohm to one ohm.
申请公布号 US6818965(B2) 申请公布日期 2004.11.16
申请号 US20010867644 申请日期 2001.05.29
申请人 CYNTEC COMPANY 发明人 JUANG HORNG-YIH;WU YING-CHANG;HUANG YI-MIN;FAN CHENG-ER
分类号 H01C1/148;H01C17/00;H01C17/28;H01L27/08;(IPC1-7):H01C27/02 主分类号 H01C1/148
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