发明名称 |
Polybenzazole article and production method thereof |
摘要 |
The present invention provides a polybenzazole article superior in light resistance, which contains a light-resisting agent that allows for a regular reflectance of the article of not more than 30% in not less than 30% of the wavelength region of from 450 nm to 700 nm and a production method thereof. The present invention provides a polybenzazole article having noticeably superior light resistance, which is preferable as industrial materials and fireman's garments, and a production method thereof.
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申请公布号 |
US6818734(B1) |
申请公布日期 |
2004.11.16 |
申请号 |
US20000502834 |
申请日期 |
2000.02.11 |
申请人 |
TOYO BOSEKI KABUSHIKI KAISHA |
发明人 |
KODAMA TETSUO;SHIMIZU YUSUKE |
分类号 |
D06M11/00;C08L79/04;D01F1/10;D01F6/74;D06M11/83;D06M13/152;D06M13/325;D06M13/332;D06M13/335;D06M13/345;D06M101/00;D06M101/16;D06M101/30;D06P1/32;(IPC1-7):C08G73/56;C08G73/00 |
主分类号 |
D06M11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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