| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processor and a plasma processing method for generating a plasma by supplying a microwave from a plurality of waveguides, and for generating a plasma with high and uniform density in a larger scale. SOLUTION: This plasma processor (10) is provided with an air-tight container (12) for generating a plasma, a dielectric member (14) arranged as a portion of the air-tight container, a plurality of waveguides (16) arranged so that electromagnetic waves can be introduced through the dielectric member to the air-tight container, an electromagnetic wave source connected to each waveguide and electromagnetic wave limiting means (30, 34, 42) for limiting an electromagnetic wave power volume propagating from the other waveguides arranged at the dielectric member. COPYRIGHT: (C)2005,JPO&NCIPI
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