| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a nanostructure capable of improving the functionality of the structure pattern of wiring or the like by a simple method. SOLUTION: In the manufacturing method of the nanostructure using a nanoimprint method, a layer 12 to be pattern-formed is provided by laminating and forming two or more layers of two or more kinds of films of different hardness on a substrate 13, a stamper 11 on which a recessed and projected structure pattern is formed is oppositely pressed to the substrate 13 provided with the layer 12 to be pattern-formed on an upper part, and the recessed and projected structure pattern of the stamper 11 is transferred to the layer 12 to be pattern-formed. The layer 12 to be pattern-formed is composed of a metal thin film 18 and a thin film 19 of resin as main component. COPYRIGHT: (C)2005,JPO&NCIPI
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