发明名称 STRUCTURE OF WASHING TUB IN SEMICONDUCTOR WASHING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a technology which prevents a washing liquid from staying in internal joints of a washing tub at the time of washing a semiconductor wafer and exhausting the washing liquid, and which shortens the drain-off time. SOLUTION: The washing tub 8 comprises four side faces 8a, 8b, 8c, and 8d which are integrally formed into one unit. The side faces 8a-8d are each constituted of a rectangular, for example, nearly square-shaped flat surface. The washing tub 8 has a bottom, and is constructed by joining the four side faces 8a-8d to one another and then jointing the four side faces 8a-8d to a bottom face 8e constituted of a flat surface having nearly the same shape as those of the side faces 8a-8d. The internal joints 8f, 8g, 8h, and 8i of the four side faces 8a-8d of the washing tub 8 are formed into, for example, an arcuate cross-sectional shape. Internal joints 8j, 8k, 8m, and 8n for joining the four side faces 8a-8d and the bottom face 8e are also formed into the arcuate cross-sectional shape of nearly the same shape, just like the internal joints 8f-8i. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004319724(A) 申请公布日期 2004.11.11
申请号 JP20030111039 申请日期 2003.04.16
申请人 SES CO LTD 发明人 SHIBAGAKI YOSHIZO
分类号 B08B3/04;H01L21/304;(IPC1-7):H01L21/304 主分类号 B08B3/04
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