| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming metal compound thin film capable of forming metal compound thin films of a high refractive index simply in large quantities and a substrate. <P>SOLUTION: In the method for forming metal compound thin film, dispersion liquid containing metal colloid particles of average particle size 1-100 nm is applied to a substrate and, thereafter, is subjected to oxidation treatment and, thereby, metal oxide is formed. Otherwise, in the method for forming metal compound thin film, metal sulfide is preferably formed by being brought into contact with a sulfide anion solution or hydrogen sulfide gas after the oxidation treatment or simultaneously with the oxidation treatment. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
