| 发明名称 |
VACUUM TREATING DEVICE |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum treating device capable of saving energy without lowering productivity. SOLUTION: An etching treating device 1 is provided with a carrying chamber 2, a plurality of treating chambers 3 and 4 and a plurality of cassette chambers 7 and 8, and a carrying mechanism 14 is provided inside the carrying chamber 2. A controller 17 is constituted so as to close the stop valve 15 of a vacuum evacuation mechanism for evacuating the carrying chamber 2 provided with the carrying mechanism 14 and stop the operation of a vacuum pump 16 when the operation of the carrying mechanism 14 is stopped for prescribed time or longer. COPYRIGHT: (C)2005,JPO&NCIPI
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| 申请公布号 |
JP2004319761(A) |
申请公布日期 |
2004.11.11 |
| 申请号 |
JP20030111686 |
申请日期 |
2003.04.16 |
| 申请人 |
TOKYO ELECTRON LTD;TOSHIBA CORP |
发明人 |
KITOKU TOSHIHIKO;NIWA SHINJI;HOSAKA SATOKI;KITAZAWA TAKASHI;MITA ATSUO;SATO YOSHITAKA |
| 分类号 |
H01L21/3065;H01L21/00;H01L21/02;H01L21/31;H01L21/677;(IPC1-7):H01L21/02;H01L21/306;H01L21/68 |
主分类号 |
H01L21/3065 |
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