发明名称 FeTa nano-oxide layer as a capping layer for enhancement of giant magnetoresistance in bottom spin valve structures
摘要 A method for forming an NiCr seed layer based bottom spin valve sensor element having a synthetic antiferromagnet pinned (SyAP) layer and a capping layer comprising either a single specularly reflecting nano-oxide layer (NOL) or a bi-layer comprising a non-metallic layer and a specularly reflecting nano-oxide layer and the sensor element so formed. The method of producing these sensor elements provides elements having higher GMR ratios and lower resistances than elements of the prior art.
申请公布号 US2004223266(A1) 申请公布日期 2004.11.11
申请号 US20040856180 申请日期 2004.05.28
申请人 HEADWAY TECHNOLOGIES, INC. 发明人 LI MIN
分类号 B32B15/01;C22C38/10;C22C38/12;G01R33/09;G11B5/31;G11B5/39;H01F10/16;H01F10/32;H01F41/30;H01L43/08;H01L43/10;H01L43/12;(IPC1-7):G11B5/39 主分类号 B32B15/01
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