发明名称 MASK GROUP, METHOD FOR MANUFACTURING MASK GROUP AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To decrease the manufacture cost of a mask group comprising a plurality of mask sheets having a plurality of kinds of layers arranged in one sheet. <P>SOLUTION: In the mask group comprising a plurality of mask sheets having a plurality of kinds of layers arranged in one sheet, the layers are allocated in each mask sheet M1 to M3 corresponding to the sequence according to prescribed specifications of the layers for the manufacture of the mask. The method for manufacturing the mask group includes: a process of sequencing a plurality of kinds of layers according to the prescribed specifications for the manufacture of the mask; and a process of constituting the plurality of mask sheets M1 to M3 by allocating a plurality of layers in one mask sheet corresponding to the sequence of the layers. The mask group is used for exposure in the method for manufacturing a semiconductor device. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2004317691(A) 申请公布日期 2004.11.11
申请号 JP20030109778 申请日期 2003.04.15
申请人 SONY CORP 发明人 TSUCHIYA KENSUKE
分类号 G03F1/68;G03F1/70;H01L21/027;(IPC1-7):G03F1/08 主分类号 G03F1/68
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