LITHOGRAPHIC APPARATUS FOR COUNTERVAILING INFLUENCE OF THICK PELLICLE, DEVICE MANUFACTURING METHOD, MASK, AND MASK AND/OR PELLICLE CHARACTERIZING METHOD

摘要

PURPOSE: A lithographic apparatus, a device manufacturing method, a mask, and a mask and/or pellicle characterizing method are provided to countervail the influence of a thick pellicle by controlling exactly each part of the lithographic apparatus using a controller. CONSTITUTION: A lithographic apparatus includes an illuminator(IL) for providing a projection beam(PB) of radiation, a support structure(MT) for supporting a patterning device(MA), a substrate table(WT) for loading a substrate(W), a projection system(PL) for projecting a patterned beam on a target of the substrate, and a controller. The controller is used for compensating or improving the displacement of an apparent mask position and image aberrations by controlling the apparatus.