SPRAY COATING APPARATUS AND METHOD TO EFFICIENTLY REDUCE QUANTITY OF USED PHOTORESIST

摘要

PURPOSE: A spray coating apparatus is provided to efficiently reduce the quantity of used photoresist required in a dispense step and a spread step of a photoresist coating process by uniformly spraying a photoresist solution of a powder state to a substrate through a spray nozzle. CONSTITUTION: A rotation chuck(7) rotates a wafer(1) at a predetermined angular velocity. A spray nozzle(20) sprays a liquid coating agent of a powder state. The velocity of a nozzle transfer unit varies with the radius of a rotating wafer in a straight path. A fume exhaust unit(13) exhausts the fume generated in drying a coating agent. A coating agent supply unit supplies the coating agent to the spray nozzle.