发明名称 |
SPUTTERING TARGET, AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a very large sputtering target obtained by butt-welding metal plates of the same quality in which the grain size and the dispersed state of metal crystals and intermetallic compounds are substantially equal between a welded zone and a non-welded zone. SOLUTION: The mean grain size of intermetallic compounds of a welded zone is 60-130% of the mean grain size of intermetallic compounds of a non-welded zone. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004307906(A) |
申请公布日期 |
2004.11.04 |
申请号 |
JP20030100782 |
申请日期 |
2003.04.03 |
申请人 |
KOBELCO KAKEN:KK |
发明人 |
MATSUMURA HITOMI;YONEDA YOICHIRO |
分类号 |
B23K20/22;C23C14/34;(IPC1-7):C23C14/34 |
主分类号 |
B23K20/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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