发明名称 SPUTTERING TARGET, AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a very large sputtering target obtained by butt-welding metal plates of the same quality in which the grain size and the dispersed state of metal crystals and intermetallic compounds are substantially equal between a welded zone and a non-welded zone. SOLUTION: The mean grain size of intermetallic compounds of a welded zone is 60-130% of the mean grain size of intermetallic compounds of a non-welded zone. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004307906(A) 申请公布日期 2004.11.04
申请号 JP20030100782 申请日期 2003.04.03
申请人 KOBELCO KAKEN:KK 发明人 MATSUMURA HITOMI;YONEDA YOICHIRO
分类号 B23K20/22;C23C14/34;(IPC1-7):C23C14/34 主分类号 B23K20/22
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