发明名称 METHOD AND APPARATUS FOR INSPECTING DEFECT INSIDE QUARTZ GLASS
摘要 PROBLEM TO BE SOLVED: To provide a defect inspection method and a defect inspecting apparatus for easily, accurately, and quickly detecting defects contained in a quartz glass material, especially minute defects, such as bubbles, and foreign objects. SOLUTION: In the method for inspecting the inside of the quartz glass material, and the apparatus for inspecting defects, the quartz glass material to be inspected is irradiated with parallel light and diffusion light having different irradiation directions, and abnormal light caused by reflection and/or bending by defects inside the quartz glass material is detected from light applied to the quartz glass material. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004309137(A) 申请公布日期 2004.11.04
申请号 JP20030098532 申请日期 2003.04.01
申请人 TOSOH CORP 发明人 TANIGUCHI TAKASHI
分类号 G01N21/958;(IPC1-7):G01N21/958 主分类号 G01N21/958
代理机构 代理人
主权项
地址