发明名称 |
METHOD AND APPARATUS FOR MONITORING, DOSING, AND DISTRIBUTION OF CHEMICAL COMPOSITIONS |
摘要 |
It is an object of the present invention to provide a system and method for monitoring, dosing and distribution of a chemical composition in a material treatment process, the chemical composition containing at least one additive for maintaining quality of the chemical treatment process. The system and method include: at least one chemical containing unit configured to contain the chemical composition for the chemical treatment process; a dosing unit fluidly communicating with the at least one chemical containing unit configured to receive the chemical composition therefrom and to add a selected dose of the at least one additive to the chemical composition therein; an online monitor configured to monitor a property of the chemical composition at the dosing unit and to transmit a signal corresponding to the monitored property; and a controller programmed and configured to receive the signal from the online monitor and send a signal to the dosing system to add the selected dose to the chemical composition therein in response to the monitored property. |
申请公布号 |
WO2004094701(A2) |
申请公布日期 |
2004.11.04 |
申请号 |
WO2004IB01183 |
申请日期 |
2004.04.20 |
申请人 |
L'AIR LIQUIDE - SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUSE |
发明人 |
ZDUNEK, ALAN, D.;GERMOUNI, OMAR;BARAJAS, ALEJANDRO, A. |
分类号 |
C25D7/12;C25D21/14;H01L21/288 |
主分类号 |
C25D7/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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