发明名称 METHOD FOR FORMING THIN MEMBRANE
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a thin membrane, by which a quality thin membrane is manufactured and a process time is reduced. SOLUTION: The method includes a coarse process step, at which laser 31 having first energy density is emitted on one surface of a board 1 that is opposite to the other board surface coated with a thin membrane 10 to eliminate a prescribed area on the board 1 by a depth reaching just before the surface coated with the thin membrane 10. The method also includes a finish process step, at which laser 32 having energy density lower than the first energy density is emitted on the area processed at the coarse process step to eliminate the prescribed area on the board 1 by the depth penetrating the surface coated with the thin membrane 10. The value of the second energy density is set equal with or more than the threshold of energy density enabling an eliminating process on the board 1 and less than the threshold of energy density enabling a deforming process on the thin membrane 10. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004305911(A) 申请公布日期 2004.11.04
申请号 JP20030102872 申请日期 2003.04.07
申请人 SEIKO EPSON CORP 发明人 UMETSU KAZUNARI
分类号 B01D69/00;B01J19/12;C23F4/00;(IPC1-7):B01D69/00 主分类号 B01D69/00
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