发明名称 |
Lithographic apparatus, device manufacturing method and angular encoder |
摘要 |
<p>In a lithographic projection apparatus, a measuring system for measuring the position of the projection system PL relative to a reference frame RF includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table WT position. An angular encoder which sends light from a target 41 down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system PL about its optical axis. <IMAGE></p> |
申请公布号 |
EP1473597(A2) |
申请公布日期 |
2004.11.03 |
申请号 |
EP20040252438 |
申请日期 |
2004.04.27 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LEENDERS, MARTINUS HENDRIKUS ANTONIUS;MEIJER, HENDRICUS JOHANNES MARIA;VAN DER PASCH, ENGELBERTUS ANTONIUS FRANSISCUS;RENKENS, MICHAEL JOZEF MATHIJS;RUIJL, THEO ANJES MARIA |
分类号 |
G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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