发明名称 |
BUFFER LAYER FOR OXIDE SUPERCONDUCTIVE THIN FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a buffer layer for growing an oxide superconductive thin film having a high critical current density, which is formed by a method wherein a CeO<SB>2</SB>layer is deposited at a high speed so as to restrain the occurrence of a (111) facet, and to prevent semicylindrical crystal grains from being formed even when the CeO<SB>2</SB>layer is thick to enable a completely c-axis oriented thin film of a Y oxide superconductor to grow on the buffer layer. SOLUTION: The buffer layer for the oxide superconductive thin film is formed through such a method wherein a CeO<SB>2</SB>buffer layer 2 of thickness 200 to 2,000Åis formed on an R plane sapphire board 1 at a deposition speed of 40 to 350Å/min and at deposition temperature of 630 to 780°C so as to obtain the oxide superconductive thin film having a high critical current density. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004303846(A) |
申请公布日期 |
2004.10.28 |
申请号 |
JP20030093045 |
申请日期 |
2003.03.31 |
申请人 |
JAPAN SCIENCE & TECHNOLOGY AGENCY |
发明人 |
MICHIGAMI OSAMU;HASHIMOTO TAKEO;MICHIGAMI YOKO |
分类号 |
C30B29/22;H01L39/02;H01L39/24;(IPC1-7):H01L39/24 |
主分类号 |
C30B29/22 |
代理机构 |
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地址 |
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