发明名称 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
摘要 |
A lithographic apparatus according to one embodiment of the invention includes an image sensing device configured and arranged to measure a pattern in a patterned beam of radiation. The image sensing device comprises a slab on which at least two sensors are formed. The sensors are sensitive to radiation of the beam and are arranged on a first side of the slab. A film that is non-transparent to radiation of the beam is provided at the first side over the sensors. The film includes a patterned segment above each sensor.
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申请公布号 |
US2004211922(A1) |
申请公布日期 |
2004.10.28 |
申请号 |
US20040847687 |
申请日期 |
2004.05.18 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KROON MARK;VAN DER WERF JAN EVERT;KOK HAICO VICTOR |
分类号 |
G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/52 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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