Device for inspecting the edges of semiconductor wafers comprises an illuminating system having light sources, a planar mirror located in the edge region of the wafer, and a camera

摘要

Device for inspecting the edges of semiconductor wafers comprises an illuminating system having light sources (20, 21, 22) inclined towards a planar front side of the wafer (2) and directly illuminating the front-side part of the edge of the wafer, a planar mirror (23) located in the edge region of the wafer and arranged parallel to the planar rear side of the wafer so that the light sources are aligned on it, and a camera (24) for taking a picture of the front-side edge surface of the wafer and the rear-side edge surface of the wafer via the planar mirror. An independent claim is also included for a process for inspecting the edge of a semiconductor wafer using the above device. Preferred Features: The camera is a line camera which is synchronized with the rotation position of the wafer. The illuminating characteristics of the illuminating system can be adjusted to different reflection properties of the wafer.