| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a reflection mask capable of preventing decrease in the reflectance derived from the deposition of the oxide generated on the surfaces of a reflecting multi-layer film and a protective film in a process of manufacturing the masks. <P>SOLUTION: A method of manufacturing a reflection mask comprising a substrate 1, a reflecting multi-layer film 2 formed on the substrate 1 and reflecting the exposure light, and buffer layers 3a and absorbing layers 4a formed into a pattern shape on the reflecting multilayer film 2 for forming non-reflection region of the exposure light, the method of manufacturing the reflection mask, comprising forming a pattern by using a plasma process containing oxygen on a Cr-based buffer layer 3 formed adjacent on an uppermost layer of the reflecting multilayer film 2, and removing an oxide layer 5 deposited on the reflecting multilayer film 2 thus exposed, by conducting a pattern forming process thereon. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
