发明名称 DEVICE FOR CUTTING A SUBSTRATE LAYER, AND CORRESPONDING METHOD
摘要 <p>An automatic cutting device is described for cutting an assembly. The assembly includes a material having a weakened zone therein that defines a useful layer and being attached to a source substrate. The cutting device includes a cutting mechanism and a holding and positioning mechanism operatively associated with the cutting mechanism. The holding and positioning mechanism positions the material so that the cutting mechanism detaches the layer from the source substrate along the weakened zone. The cutting device also includes a control mechanism for adjusting at least two different portions of the assembly during detachment of the layer to facilitate a more precise detachment.</p>
申请公布号 EP1469981(A1) 申请公布日期 2004.10.27
申请号 EP20030712201 申请日期 2003.01.02
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES 发明人 RAYSSAC, OLIVIER;LETERTRE, FABRICE
分类号 B28D1/22;B28D5/00;H01L21/20;H01L21/762;(IPC1-7):B28D5/00 主分类号 B28D1/22
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