| 摘要 |
A method of making a reticle. Design data, i.e., GDSII data is read in, then a scribe or frame is built, and the design is placed in the scribe. Then, Boolean operations, sizing, OPC corrections and phase shifting are performed, as needed, perhaps using third party tools. Then, the GDS data is sorted, and a new GDS hierarchy is created where each mask layer can be generated as one mask making pattern, i.e., new cells are created representing each masking image location on the reticle, each new cell is placed in a topcell, then a gds2 file is produced where the gds2 file can be used to create a reticle or can be used to create reticle making data.
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