发明名称 Hall element made using semiconductor technology for use in integrated circuits formed of first and second semiconductor regions in a recess
摘要 <p>The Hall element has a first semiconductor region having Hall sensitivity and being of a first conductive type. A recess is provided and formed of a second conductive type different from the first. The first semiconductor region is embedded in the recess. A second semiconductor region of the first conductive type is also embedded in the recess. Preferably the first region has two Hall voltage connectors as control parameter contacts to which is applied a variable control parameter and two secondary side contacts as measurement parameter contacts. Independent claims also cover a method of making and a method of operating such a Hall element.</p>
申请公布号 DE10313948(A1) 申请公布日期 2004.10.21
申请号 DE2003113948 申请日期 2003.03.27
申请人 INFINEON TECHNOLOGIES AG 发明人 AUSSERLECHNER, UDO
分类号 G01R33/07;H01L43/06;(IPC1-7):H01L43/06 主分类号 G01R33/07
代理机构 代理人
主权项
地址