| 摘要 |
PURPOSE: A method of correcting a defect of a graytone mask is provided to selectively vary a thickness of a photoresist film by reducing light transmittance, thereby obtaining high correction accuracy. CONSTITUTION: A method of correcting a defect of a graytone mask is characterized in that transmittance of light transmitting a region consisting of a light-shielding layer(1), a light-transmitting layer(2), and light-shielding patterns(3a,3b) having resolution lower than that of an exposure meter using a graytone mask is reduced to correct a defect of a graytone portion(3). If a black defect occurs in the graytone portion, a film thickness corresponding to the entire area of the black defect, some area of the black defect, or an area including the black defect is reduced by etching to obtain graytone effect equal to a normal graytone portion. If a white defect occurs in the graytone portion, a semi-transmitting correction film is formed in the entire area of the white defect, some area of the white defect, or an area including the white defect by an FIB(Focused Ion Beam) correction method to obtain graytone effect equal to a normal graytone portion.
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