发明名称 |
METHOD AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method and a system for manufacturing a semiconductor device by which the mass production of a semiconductor device can be developed smoothly by selecting an aligner by evaluating the product transferability of the aligner by a simple method without using any special reticle nor a sensor on the aligner. SOLUTION: The aligner is selected without performing any trial calcining by calculating coma aberration and curvature of field having effects on the dimensional distribution of the circuit pattern of a semiconductor device, and predicting whether or not the circuit pattern satisfies the standard of the semiconductor device at the time of transferring the pattern. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004288694(A) |
申请公布日期 |
2004.10.14 |
申请号 |
JP20030075743 |
申请日期 |
2003.03.19 |
申请人 |
RENESAS TECHNOLOGY CORP |
发明人 |
YOSHITAKE YASUHIRO;MATSUMOTO SHUNICHI |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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