| 发明名称 |
Conditioner disk for use in chemical mechanical polishing |
| 摘要 |
A conditioner disk for use on a polish pad in chemical mechanical polishing process includes a base structure a plurality of curved blades supported by the base structure. The blades radiate outwardly from a center region of the base structure and curve in a common direction.
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| 申请公布号 |
US2004203325(A1) |
申请公布日期 |
2004.10.14 |
| 申请号 |
US20030409888 |
申请日期 |
2003.04.08 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
DONOHUE TIMOTHY J. |
| 分类号 |
B24B37/04;B24B53/12;(IPC1-7):B24B1/00;B24B21/18;B24B33/00;B24B47/26;B24B55/00 |
主分类号 |
B24B37/04 |
| 代理机构 |
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代理人 |
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