发明名称 BARRIER LAYERS FOR MICROELECTROMECHANICAL SYSTEMS
摘要 A method for processing microelectromechanical devices is disclosed herein. The method prevents the diffusion and interaction between sacrificial layers and structure layers of the microelectromechanical devices by providing selected barrier layers between consecutive sacrificial and structure layers.
申请公布号 WO2004087563(A2) 申请公布日期 2004.10.14
申请号 WO2004US09231 申请日期 2004.03.24
申请人 REFLECTIVITY, INC.;PATEL, SATYADEV, R.;DOAN, JONATHAN 发明人 PATEL, SATYADEV, R.;DOAN, JONATHAN
分类号 B81B7/00;B81C;B81C1/00;H01L21/00;H01L21/76 主分类号 B81B7/00
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