发明名称 CONTROLLED-PARAMETER REPETITIVE-PULSE CHEMICAL LASER (ALTERNATIVES)
摘要 FIELD: quantum electronics. ^ SUBSTANCE: laser has gas-discharge tube placed in cavity and connected to inductance coil, main and additional active-medium excitation pulse sources, and controllable delay line of active-medium excitation pulse source. Laser designed to first and second alternative has in addition storage capacitor with parallel-connected resistor and control pulse length shaper. Laser of third design alternate has in addition diode with parallel-connected resistor and control pulse length shaper. ^ EFFECT: enhanced operating reliability, reduced mass, size, and cost. ^ 4 cl, 6 dwg
申请公布号 RU2237955(C2) 申请公布日期 2004.10.10
申请号 RU20020112599 申请日期 2002.05.13
申请人 发明人 JUDIN N.A.
分类号 H01S3/09;H01S3/00 主分类号 H01S3/09
代理机构 代理人
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