SEMICONDUCTOR DEVICE AND METHOD OF PROCESSING SEMICONDUCTOR SUBSTRATE FOR IMPROVING OPTICAL PROPERTIES

摘要

PURPOSE: A semiconductor device and a method of processing a semiconductor substrate are provided to minimize the amount of light interrupted due to the substrate by securing the angle between a side of a concavity and a second main surface of the substrate as much as 90 degrees or more. CONSTITUTION: A semiconductor substrate(1) has a first main surface(3b) and a second main surface(3a). A device forming layer(2) is formed on the first main surface of the substrate. A concavity(4) is formed at the second main surface of the substrate. A convexity(5) is formed at a bottom of the concavity, wherein the convexity is functioned as a solid immersion lens. The angle between a side(4b) of the concavity and the second main surface is larger than 90 degrees.