| 摘要 |
PROBLEM TO BE SOLVED: To reduce the unevenness arising due to a stitch error when a substrate is subjected to divided exposure. SOLUTION: In subjecting the surface of the substrate to the divided exposure, overlapping stitch regions are formed in the boundary portions between adjacent shots to decrease the stitch phenomena generated by the error in the brightness between the two regions. For example, the number of unit stitch regions subjected to light shielding by the first shot is gradually decreased, the number of exposure regions of the unit stitch regions is gradually increased and the brightness is continuously changed toward the prescribed direction within the stitch regions. Conversely, the number of unit stitch regions subjected to light shielding when the same stitch regions are exposed by the second shot is gradually increased and the number of exposure regions of the unit stitch regions is gradually decreased. At this time, the number and positions of the unit stitch regions subjected to the light shielding or exposure in the respective shots are determined by a random number program. COPYRIGHT: (C)2005,JPO&NCIPI |
