| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for simply preparing a solution usable for the use of etching and cleaning. SOLUTION: The preparation method of the solution for etching or cleaning is provided, wherein the solution is characterized by containing (1) at least one fluoride salt or bifluoride salt formed from at least one selected from the group consisting of ammonia, hydroxylamines, aliphatic amines, aromatic amines, and aliphatic or aromatic quaternary ammonium salts, and hydrofluoric acid; (2) at least one organic solvent having a hetero atom; and (3) water. The method comprises step 1: mixing an aqueous solution of hydrofluoric acid and at least one organic solvent having a hetero atom and step 2: mixing the mixture obtained in the step 1 with at least one selected from the group consisting of ammonia, hydroxyl amines, aliphatic amines, aromatic amines, and aliphatic or aromatic quaternary ammonium salts, or a fluoride salt thereof. COPYRIGHT: (C)2005,JPO&NCIPI
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