| 发明名称 |
Method and apparatus for performing hydrogen optical emission endpoint detection for photoresist strip and residue removal |
| 摘要 |
A method for monitoring and detecting a hydrogen optical emission while performing photoresist stripping and removal of residues from a substrate or a film stack on a substrate.
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| 申请公布号 |
US2004195208(A1) |
申请公布日期 |
2004.10.07 |
| 申请号 |
US20040776672 |
申请日期 |
2004.02.11 |
| 申请人 |
PAVEL ELIZABETH G.;KAWAGUCHI MARK N.;PAPANU JAMES S. |
发明人 |
PAVEL ELIZABETH G.;KAWAGUCHI MARK N.;PAPANU JAMES S. |
| 分类号 |
H01J37/32;H01L21/306;H01L23/00;(IPC1-7):H01L21/306 |
主分类号 |
H01J37/32 |
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