METHOD OF ALIGNING SUBSTRATE,COMPUTER PROGRAM,DEVICE MANUFACTURING METHOD, AND THE DEVICE MANUFACTURED THEREBY

摘要

PROBLEM TO BE SOLVED: To provide a method for which substrate (wafer) alignment to a reference mark is improved. SOLUTION: While the alignment beam is focused on the mark on the substrate table, the substrate table is moved substantially perpendicular to the alignment beam. If the image of the mark moves relative to the reference mark, the substrate and the alignment beam will not be perpendicular. The positions of the marks on the substrate table are adjusted so as to coincide with those of a plurality of reference marks. Although at least two substrate marks are aligned with a single reference mark, errors due to inclination of the alignment beam are excluded from the expansion and rotation values calculated with respect to the substrate. COPYRIGHT: (C)2005,JPO&NCIPI