发明名称 FILM DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To film-deposit a carbon nanotube on a substrate with a large area. SOLUTION: A substrate 17 is carried in a vacuum tank 11. AC pulse voltage is applied to the space between a sample stage 16 and an electrode 18. A gaseous starting material is introduced into the vacuum tank 11, and a thin film of a carbon nanotube is grown onto the surface of a thin film of a catalyst material. Thus, the carbon nanotube can be film-deposited even on the surface of the substrate with a large area only by increasing the areas of the sample stage 16 and the electrode 18. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004277871(A) 申请公布日期 2004.10.07
申请号 JP20030075058 申请日期 2003.03.19
申请人 ULVAC JAPAN LTD;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 AGAWA YOSHIAKI;GOTO SEIICHI;KIUCHI MASATO;SUGIMOTO TOSHIMOTO
分类号 C01B31/02;C23C16/26;C23C16/503;(IPC1-7):C23C16/503 主分类号 C01B31/02
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