| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of suppressing the pattern image deterioration caused by air bubbles in a liquid in exposure processing by filling a space with liquid between a projection optical system and a substrate. SOLUTION: The exposure apparatus is furnished with a liquid supply device 1 for filling at least a part of the space with the liquid 50 between the projection optical system and the substrate. The exposure apparatus exposes the substrate by projecting the image of a pattern on the substrate via the projection optical system. The liquid supply device 1 has a deaerator 21 for suppressing the generation of the air bubbles in the liquid 50. COPYRIGHT: (C)2005,JPO&NCIPI
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