| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid draining unit of substrate treatment equipment wherein the liquid on the surface of a substrate is effectively drained while jetting quantity of gas made little. SOLUTION: The liquid draining unit of substrate treatment equipment 22 is provided with a transfer means 18, a chemical spreading means 14 and a liquid tank 20. The liquid draining unit is provided with a suction means 12 which is arranged perpendicularly to a travelling direction of a conveyed substrate 16, and sucks and eliminates chemical which is spread on the surface of the substrate 16 by using the chemical spreading means 14. The liquid draining unit is also provided with a blower means 10 which is arranged in parallel behind the suction means 12, spouts gas to the surface of the substrate 16 after the chemical is eliminated, performs push-back of the chemical which is not sucked with the suction means 12 and remains on the surface of the substrate 16 to the suction means 12 side, and makes the suction means 12 suck the chemical. COPYRIGHT: (C)2005,JPO&NCIPI
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