发明名称 Method of providing a layer including a metal or silicon or germanium and oxygen on a surface
摘要 A method of providing a layer including a metal or silicon or germanium and oxygen on a surface, the method including the steps of forming an adsorbed layer less than 12 monolayers thick on the surface by exposing it to a liquid or vapor containing metal-, silicon-, or germanium-containing organic molecules, and treating this layer by exposure to a glow discharge in an oxygen containing gas, thereby converting the adsorbed layer to a layer including silicon (or germanium) and oxygen.
申请公布号 US2004195966(A1) 申请公布日期 2004.10.07
申请号 US20040477336 申请日期 2004.04.19
申请人 CONWAY NATASHA M J;MOSLEY ALAN 发明人 CONWAY NATASHA M J;MOSLEY ALAN
分类号 B05D1/18;B05D3/04;B05D3/10;B05D3/14;B05D7/24;H01L29/16;H01L33/00;H01L51/30;H01L51/50;H01L51/52;H05B33/10;(IPC1-7):H05B33/02;C23C16/06 主分类号 B05D1/18
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