发明名称 |
Method of providing a layer including a metal or silicon or germanium and oxygen on a surface |
摘要 |
A method of providing a layer including a metal or silicon or germanium and oxygen on a surface, the method including the steps of forming an adsorbed layer less than 12 monolayers thick on the surface by exposing it to a liquid or vapor containing metal-, silicon-, or germanium-containing organic molecules, and treating this layer by exposure to a glow discharge in an oxygen containing gas, thereby converting the adsorbed layer to a layer including silicon (or germanium) and oxygen.
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申请公布号 |
US2004195966(A1) |
申请公布日期 |
2004.10.07 |
申请号 |
US20040477336 |
申请日期 |
2004.04.19 |
申请人 |
CONWAY NATASHA M J;MOSLEY ALAN |
发明人 |
CONWAY NATASHA M J;MOSLEY ALAN |
分类号 |
B05D1/18;B05D3/04;B05D3/10;B05D3/14;B05D7/24;H01L29/16;H01L33/00;H01L51/30;H01L51/50;H01L51/52;H05B33/10;(IPC1-7):H05B33/02;C23C16/06 |
主分类号 |
B05D1/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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