| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask with which a diffuse reflection plate with high reflection luminance can be manufactured without generating interference fringes nor unevenness, and the diffuse reflection plate. <P>SOLUTION: This photomask is characterized in that center points 11 to 19 in a unit area R1 are arranged so that the mean value A and standard deviation B of areas of a group of Delaunay triangles, consisting of center points 11 to 19, 31, 34, 37, 21, 22, and 23, are within specified numeral ranges. Consequently, a photomask is obtained which has pattern arrangement free of a join between unit areas even nearby border lines Bd2 and Bd3, and a diffuse reflection plate can be manufactured which has high reflection luminance in a state wherein neither interference fringes nor unevenness is generated. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
