| 发明名称 |
Method of manufacturing a monocrystalline semiconductor wafer with mirror-finished surface including a gas phase etching and a heating step, and wafers manufactured by said method |
| 摘要 |
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| 申请公布号 |
EP0798766(B1) |
申请公布日期 |
2004.10.06 |
| 申请号 |
EP19970302061 |
申请日期 |
1997.03.26 |
| 申请人 |
SHIN-ETSU HANDOTAI COMPANY LIMITED |
发明人 |
OISHI, HIROSHI |
| 分类号 |
H01L21/302;C30B33/00;H01L21/304;H01L21/3065;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/302 |
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