发明名称 |
Laser oscillating apparatus, exposure apparatus, and device fabrication method |
摘要 |
An excimer laser gas in a laser tube 2 is excited by a microwave introduced from awaveguide 1, and electric field concentration occurs in a slit-shaped gap 3 provided in a plate member 11c, causing plasma discharge. Then the phase of plasma light is regulated and the light is resonated, to cause excimer laser light. This construction realizes plasma excitation entirely uniform along a lengthwise direction of laser light emission, and enables uniform laser light emission with minimum energy loss.
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申请公布号 |
US6801554(B1) |
申请公布日期 |
2004.10.05 |
申请号 |
US20000531958 |
申请日期 |
2000.03.21 |
申请人 |
CANON KABUSHIKI KAISHA;OHMI TADAHIRO |
发明人 |
OHMI TADAHIRO;SUZUKI NOBUMASA;OHSAWA HIROSHI;TANAKA NOBUYOSHI;SHINOHARA TOSHIKUNI;HIRAYAMA MASAKI |
分类号 |
H01L21/027;G03F7/20;H01S3/03;H01S3/0973;H01S3/0975;H01S3/225;(IPC1-7):H01S3/00;H01S3/22 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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