发明名称 |
Substrate selector |
摘要 |
Substrate-selecting equipment selects substrates used for objective products from among a group of substrates with photosensitive material layers used for the production of photomask. The substrate-selecting equipment comprises one or more of the defect-registering part(s) for registering the results of the inspection of defects of substrates with photosensitive material layers in database, the photosensitive material layer lot check result-registering part for registering the results of check of lots of photosensitive material layers in database and the substrate-selecting part for selecting substrates used for the production of objective products from among a group of substrates with photosensitive material layers, on the basis of the results of inspection of defects and the results of check of lots of photosensitive materials registered in database. |
申请公布号 |
US6801824(B2) |
申请公布日期 |
2004.10.05 |
申请号 |
US20020049051 |
申请日期 |
2002.05.10 |
申请人 |
DAINIPPON PRINTING CO., LTD. |
发明人 |
ISHIDA KOUJI;YAMAZAKI KIYOSHI;NARA HIDEYUKI;SEINO HAJIME |
分类号 |
G03F1/08;G03F1/00;G03F1/68;G03F1/84;G05B19/418;H01L21/027;(IPC1-7):G06F19/00;H01L21/66 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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