发明名称 Stabilized oscillator circuit for plasma density measurement
摘要 A method and system for controlling electron densities in a plasma processing system. By applying a dither voltage and a correction voltage to a voltage-controlled oscillator, electron (plasma) density of a plasma processing system (acting as an open resonator) may be measured and controlled as part of a plasma-based process.
申请公布号 US6799532(B2) 申请公布日期 2004.10.05
申请号 US20030650802 申请日期 2003.08.29
申请人 TOKYO ELECTRON LIMITED 发明人 SIRKIS MURRAY D.;VERDEYEN JOSEPH T.
分类号 H05H1/00;(IPC1-7):C23C16/00;C23F1/02 主分类号 H05H1/00
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