发明名称 |
Stabilized oscillator circuit for plasma density measurement |
摘要 |
A method and system for controlling electron densities in a plasma processing system. By applying a dither voltage and a correction voltage to a voltage-controlled oscillator, electron (plasma) density of a plasma processing system (acting as an open resonator) may be measured and controlled as part of a plasma-based process.
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申请公布号 |
US6799532(B2) |
申请公布日期 |
2004.10.05 |
申请号 |
US20030650802 |
申请日期 |
2003.08.29 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
SIRKIS MURRAY D.;VERDEYEN JOSEPH T. |
分类号 |
H05H1/00;(IPC1-7):C23C16/00;C23F1/02 |
主分类号 |
H05H1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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