发明名称 MANUFACTURING METHOD FOR LIQUID INJECTION HEAD
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for a liquid injection head in which ferroelectric precursor films on a plurality of silicon wafers can be burned simultaneously, and a displacement amount of a diaphragm can be maintained uniformly. SOLUTION: A ferroelectric film of a predetermined thickness which constitutes a piezoelectric layer is formed by carrying out by a predetermined number of times, a film formation process of forming the ferroelectric precursor film on a metal layer after forming the metal layer to be a lower electrode of a piezoelectric element at a surface of the silicon wafer 100 to be a channel formation substrate, and a burning process of heating and burning the ferroelectric precursor film via the silicon wafer 100 through a sequence of operations of fixing each silicon wafer 100 to each stage 251 of a holding member 250 with a plurality of the stages 251 arranged in an array, inserting the holding member 250 from the side of one end stage into a preliminarily heated diffusion furnace 203, and also discharging the holding member 250 from the side of the other end stage. Moreover, an order of the stages 251 is switched for every burning process so that a thermal history applied to the metal layer becomes nearly uniform after the end of the burning process of the predetermined number of times. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004268414(A) 申请公布日期 2004.09.30
申请号 JP20030062371 申请日期 2003.03.07
申请人 SEIKO EPSON CORP 发明人 RI KINZAN
分类号 B41J2/16;(IPC1-7):B41J2/16 主分类号 B41J2/16
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